Emerging Maskless Nanolithography Based on Novel Diffraction Gratings
نویسندگان
چکیده
Guanxiao Cheng1,2,3, Yong Yang4, Chao Hu2,3,5, Ping Xu1, Helun Song6, Tingwen Xing4 and Max Q.-H. Meng2,3 1College of Electronic Science and Technology, Shenzhen University, Shenzhen, 2Shenzhen Institutes of Advanced Technology, Chinese Academy of Sciences, Shenzhen, 3The Chinese University of Hong Kong, Hong Kong, 4Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, 5Ningbo Institute of Technology, Zhejiang University, Ningbo, 6Suzhou Institute of Nano-tech and Nano-bionics, Chinese Academy of Sciences, Suzhou, China
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